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KemLab™ APOL-LO 3200 is a negative tone, advanced photoresist with Lift-Off profile for i-Line, and broadband applications.

KemLab™ APOL-LO 3200 negative lift off photoresist features improved resolution and a wider process window compared to the original negative lift-off KL1600.​​ It is designed for use with industry standard photoresist developers. Custom formulations are available to adjust lift-off angle and the photospeed. Film Thickness Range: 2 to 10+ microns.

Applicatons: Compound Semiconductors and LED manufacturing. Competes with AZ® nLOF™2020, AZ® nLOF™2035 and AZ® nLOF™2070.

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